This is early beta for now! Can't handle all templates properly
Hankkija
Vastaanotettu Hilmaan | 2020-05-12 |
Ilmoituksen numero | 2020-046308 |
TED numero | 2020/S 093-221701 |
Ostajaorganisaatio | Aalto University Foundation sr (2228357-4 ) P.O. Box 11000 FI-00076 AALTO http://www.aalto.fi/en/ |
Hankinnan otsikkotiedot | Inductively-coupled plasma reactive-ion etching (ICP-RIE) device |
Hankinnan yhteenlaskettu kokonaisarvo koko ajalle (ilman alv:ta) arvio | |
Hankinnan yhteenlaskettu kokonaisarvo koko ajalle (ilman alv:ta) lopullinen | |
Alkuperäinen ilmoitus | https://www.hankintailmoitukset.fi/sv/public/procurement/35947/notice/46308/overview |
Originaali JSON tietue | 46308.json |
Ostettava
Hankinnan lyhyt kuvaus | Aalto University School of Electrical Engineering and School of Chemical Engineering are seeking a complete turn-key, stand-alone deep reactive ion etcher to be used in silicon etching. The equipment should be capable of running both close to room-temperature Bosch processes and cryo-processes without hardware changes in the equipment. The equipment should be capable of adjusting plasma power over wide range enabling high etch rate silicon etch processes, low damage shallow etching and black silicon etching. The DRIE equipment will be installed into an ISO 5 class cleanroom and should be fully compatible with the requirements of such environment. Please, see attached documents for more detailed requirements for the object of the contract. |
Hankintanimikkeistö (CPV) pää | Dry-etching equipment (22520000) |
Hankintanimikkeistö (CPV) muut | |
Aluekoodi | FI1B1 |