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Hankkija

Vastaanotettu Hilmaan2020-05-12
Ilmoituksen numero2020-046308
TED numero2020/S 093-221701
OstajaorganisaatioAalto University Foundation sr (2228357-4 )
P.O. Box 11000
FI-00076 AALTO
http://www.aalto.fi/en/
Hankinnan otsikkotiedotInductively-coupled plasma reactive-ion etching (ICP-RIE) device
Hankinnan yhteenlaskettu kokonaisarvo koko ajalle (ilman alv:ta) arvio
Hankinnan yhteenlaskettu kokonaisarvo koko ajalle (ilman alv:ta) lopullinen
Alkuperäinen ilmoitushttps://www.hankintailmoitukset.fi/en/public/procurement/35947/notice/46308/overview
Originaali JSON tietue46308.json

Ostettava

Hankinnan lyhyt kuvausAalto University School of Electrical Engineering and School of Chemical Engineering are seeking a complete turn-key, stand-alone deep reactive ion etcher to be used in silicon etching. The equipment should be capable of running both close to room-temperature Bosch processes and cryo-processes without hardware changes in the equipment. The equipment should be capable of adjusting plasma power over wide range enabling high etch rate silicon etch processes, low damage shallow etching and black silicon etching. The DRIE equipment will be installed into an ISO 5 class cleanroom and should be fully compatible with the requirements of such environment. Please, see attached documents for more detailed requirements for the object of the contract.
Hankintanimikkeistö (CPV) pääDry-etching equipment (22520000)
Hankintanimikkeistö (CPV) muut
AluekoodiFI1B1