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"A. BACKGROUND INFORMATION",
"",
"Tampere University is well prepared for the fabrication of flexible electronics, especially thin film transistors (TFT) in conjunction with ALD dielectric and semiconductor films in the Laboratory for Future Electronics (LFE, https:\/\/research.tuni.fi\/lfe\/), a specialized electronics printing and solution processed device fab. LFE laboratory has over 250 m2 dedicated lab space, which includes 60 m2 dust-free processing laboratory. ",
"",
"LFE has a unique MBRAUN glovebox cluster tool system used for device fabricating and characterization (probe-station inside) for seamless flexible electronics processing and characterization within an inert nitrogen ambient. The cluster tool system includes integrated inkjet printer, spin coater, vacuum hot-plate, e-beam\/thermal metal evaporator, and Beneq TFS 200-273 ALD (thermal and plasma) with load-locked entry. ",
"",
"LFE\u2019s state-of-the-art printing facility includes inkjet printers (CeraPrinter F-Series, Super-fine Inkjet printer, three Dimatix printers, one inside a nitrogen filled glovebox and one in clean room), gravure, flexo, rotary screen and lamination (both dry and wet) (Schl\u00e4fli Challenger 174), automatic screen printer (Ekra) and a plasma printer for high resolution surface energy patterning. ",
"",
"Equipment for electrical characterization includes probe stations, semiconductor analyzers, and oscilloscopes. Mechanical properties of functional materials are tested with developed multi-axial system. Ferroelectric material and piezoelectric material testing are also available. Specialized analysis methods for e.g., microscopy, FIBSEM, and surface characterization are available through other laboratories at the university.",
"",
"",
"B. NEED",
"",
"Leveraging the already unique LFE cluster tool system, university will extend its uniqueness by advancing a new field of ultra-low temperature atomic layer deposition (ALD) combined with a new high-power, pulsed ultraviolet (UV) laser system, in-situ, to the ALD films, to suppress processing temperatures. Both ALD high-\u03ba gate dielectrics and ALD metal-oxide semiconductor channels will be explored for these thin film transistors (TFT). Judicious laser annealing will reduce gate leakage through reduction of electrical point defects; promote higher channel mobility, enabling high performance transistors.",
"",
"In order to achieve this enhanced uniqueness, LFE proposes to add a ~4-Watt pulsed excimer laser (193nm) to the ALD reactor, such that an in-situ laser spot can scan across a \u2264138mm wafer (constrained by the UV window size) in between ALD process gas pulses. The ultra-short laser wavelength will promote very high absorption of the laser energy to be absorbed in the top 10\u2019s of nanometers only, thereby preserving soft substrates below from melting or curling. Already two key metal vacuum lids are being modified by TAU\u2019s machine shop to incorporate ultra-violet (UV) grade fused silica glass windows (Suprasil CG), enabling a laser beam to irradiate a sample inside the ALD deposition chamber during the ALD process. ",
"",
"To our knowledge, no other such system exists in the world and certainly not in our domain space of flexible electronics. This will position LFE as a unique, one-of-a-kind in the world, empowering processing fidelity not achieved anywhere else on the planet.",
"",
"",
"C. MARKET ANALYSIS AND CONCLUSION FOR DIRECT AWARD",
"",
"According to the section 40 of the Act on Public Procurement and Concession Contracts (1397\/2016) a contracting entity may opt for direct procurement if only a certain supplier can implement the procurement for a technical reason, or for a reason related to protecting an exclusive right. ",
"According to the section 41 of the Act on Public Procurement and Concession Contracts a contracting entity may opt for direct procurement if purpose of an additional order is to partially replace or expand functionalities for existing equipment or delivery. It shall be a further condition that a change of supplier regarding the originally set up equipment or delivery would lead to incompatibility or to significant problems in use and maintenance.",
"",
"The core of this acquisition is an excimer laser system, capable of delivering 193nm laser light with high intensity. So already, this stratifies the laser market to only a handful of players. But the laser system to be procured here is not just a simple laser. This laser \u201csystem\u201d requires also the optics to deliver the laser light up, and over, followed by vertically down into the pre-existing ALD reactor. Ultraviolet laser light at these extremely short wavelengths generates harmful ozone when it passes through room air. Ozone would be detrimental to both the lungs of nearby workers as well as corrosive to surrounding high-tech equipment, collocated within LFE. Furthermore, the ability to direct the laser beam onto the sample surface by either a variable focus spot size, or a rastered beam, would permit an additional freedom of experimental design to vary the laser energy per unit area delivered to the sample surface. Laser companies rarely sell the additional optics needed too, focusing solely on the laser system only. Depending upon sample materials and conditions, there may be a variety of threshold energies to promote ALD film recrystallization. So, having that variability through the optical lens design will enhance the efficacy of this laser system to dial in the optimal annealing parameters.",
"",
"Coherent laser is uniquely qualified to address all these needs. Coherent will include optical rails in their laser system that will be vacuum evacuated in order to prevent 193nm from passing through room air, thereby mitigating the generation of any harmful ozone. Coherent is also well equipped to design an optical system to beam steer the laser beam up, over, and down into the ALD reactor. What sets Coherent apart from other laser manufacturers is that they are the industry leader in laser annealing of polycrystalline silicon for large flat panel displays. This is the closest facsimile to the intended experiments here for TFT materials and other flexible electronics elements.",
"",
"Due to technical and compatibility reasons, only the specific supplier can be considered. Reasonable alternatives or substitute solutions do not exist, and absence of competition is not due to an artificial narrowing of purchase conditions. Contracting authority has the right to set a quality level based on its own needs which products or services must implement.",
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